| Title: | CHEMICAL PHYSICS OF THIN FILM DEPOSITION PROCESSES FOR MICRO- AND NANO- TECHNOLOGIES |
| Authors: | Yves Pauleau, Editor |
| Material Type: | printed text |
| Publisher: | Dordrecht : Kluwer Academic Publishers, 2002 |
| Series: | NATO Science Series. Series II : Mathematics, Physics and Chemistry, num. 55 |
| ISBN (or other code): | 978-1-4020-0525-1 |
| Size: | xiv-363 p. / 24 cm |
| Languages: | English |
| Class number: | MATE (MATERIAUX) |
| Keywords | Chemical preparation , Chemical vapour deposition , CVD , Electrochemistry , Epitaxy , Nanostructure , Sputtering , Thin films |
Copies (1)
| Barcode | Call number | Media type | Location | Section | Status | Commentaire |
|---|---|---|---|---|---|---|
| 007442 | MATE3 ASI/C/S | papier | CNRS | MATE (MATERIAUX) | Available |
