| Title: | HANDBOOK OF PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING : Film formation, adhesion, surface prpreparation and contamination control |
| Authors: | Donald M. Mattox, Author |
| Material Type: | printed text |
| Publisher: | New York NY : Noyes Publications, 1998 |
| ISBN (or other code): | 978-0-8155-1422-0 |
| Size: | 917 p. / 25 cm |
| Languages: | English |
| Class number: | MATE (MATERIAUX) |
| Keywords | Adhesion , Chemical vapour deposition , CVD , Deposition , Growth , Handbook , Sputtering , Thin films |
Copies (1)
| Barcode | Call number | Media type | Location | Section | Status | Commentaire |
|---|---|---|---|---|---|---|
| 007156 | MATE3 MAT | papier | CNRS/armoire | MATE (MATERIAUX) | Not for loan |
