| Title: | HANDBOOK OF THIN-FILM DEPOSITION PROCESSES AND TECHNIQUES : Principles, methods, equipment and applications |
| Authors: | Klaus K. Schuegraf, Author |
| Material Type: | printed text |
| Publisher: | New Jersey NJ : Noyes Data Corporation, 1988 |
| Series: | Materials Science and Process Technology Series |
| ISBN (or other code): | 978-0-8155-1153-3 |
| Size: | 413 p. / 24 cm |
| Languages: | English |
| Class number: | MATE (MATERIAUX) |
| Keywords | Chemical vapour deposition , CVD , Deposition , Handbook , MBE , Molecular beam epitaxy , Sputtering , Thin films |
Copies (1)
| Barcode | Call number | Media type | Location | Section | Status | Commentaire |
|---|---|---|---|---|---|---|
| 006839 | MATE3 SCH | papier | CNRS | MATE (MATERIAUX) | Available |
