Bibliothèque du groupe de laboratoires de physique

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HANDBOOK OF SEMICONDUCTOR MANUFACTURING TECHNOLOGY : Second edition

Robert Doering, Editor ; Yoshio Nishi, Editor | Boca Raton FL : CRC Press | 2008

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PROCEDES CHIMIQUES DE DEPOT A PARTIR D'UNE PHASE GAZEUSE

Yves Pauleau, Author | Paris : Hermès science publications | 2004

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CHEMICAL PHYSICS OF THIN FILM DEPOSITION PROCESSES FOR MICRO- AND NANO- TECHNOLOGIES

Yves Pauleau, Editor | Dordrecht : Kluwer Academic Publishers | NATO Science Series. Series II : Mathematics, Physics and Chemistry | 2002

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INORGANIC MATERIALS SYNTHESIS : New directions for advanced materials

Charles H. Winter, Author ; David M. Hoffman | Washington DC : American Chemical Society | ACS Symposium Series | 1999

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HANDBOOK OF PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING : Film formation, adhesion, surface prpreparation and contamination control

Donald M. Mattox, Author | New York NY : Noyes Publications | 1998

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DIAMOND AND DIAMOND-LIKE FILMS AND COATINGS

Robert E. Clausing, Editor ; Linda L. Horton, Editor ; John C. Angus, Editor ; Peter Koidl, Editor | New York NY : Plenum Press | NATO ASI Series. Series B : Physics | 1991

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HANDBOOK OF THIN-FILM DEPOSITION PROCESSES AND TECHNIQUES

Klaus K. Schuegraf, Author | New York NY : Noyes Publications | Materials Science and Process Technology Series | 1988

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HANDBOOK OF THIN-FILM DEPOSITION PROCESSES AND TECHNIQUES : Principles, methods, equipment and applications

Klaus K. Schuegraf, Author | New Jersey NJ : Noyes Data Corporation | Materials Science and Process Technology Series | 1988

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MODERN CRYSTALLOGRAPHY III : Crystal Growth

A.a. Chernov, Author | Berlin : Springer-Verlag | Springer Series in Solid State Sciences | 1984

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CHEMICAL VAPOR DEPOSITION : Proceedings of the 5th International Conference, 1975

J.m. Blocher, Author ; H.e. Hintermann ; L.h. Hall ; Chemical Vapor Depos (1975-09-21/26; Buckinghamshire, GB) | Princeton University Press | 1975

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CHEMICAL VAPOR DEPOSITION OF REFRACTORY METALS, ALLOYS, AND COMPOUNDS : Proceedings of the conference on chemical vapor deposition of refractory metals, alloys, and compounds. Gatlinburg, Tennessee. September 12-14, 1967

A. C. Schaffhauser, Editor ; Chemical Vapor (1967-09-12/14; Gatlinburg, TN, USA) | Hinsdale IL : American Nuclear Society | 1967

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